◆Commercialized atomic force microscope for combined mobile scanning of probes and samples;
◆Adopting a three-axis independent closed-loop piezoelectric translation scanning stage to achieve large-scale high-precision scanning;
◆Three axis independent scanning,XYZNot affecting each other, very suitable for 3D material and morphology detection;
◆Electric control sample moving table and lifting table, programmable multi-point position for fast and automated detection;
◆Longmen style scanning head design, marble base, vacuum adsorption and magnetic adsorption stage;
◆Intelligent needle insertion method for automatic detection of pressurized ceramic by motor control, protecting probes and samples;
◆High magnification assisted optical microscopy positioning, real-time observation and positioning of probes and sample scanning areas;
◆The closed-loop piezoelectric scanning table does not require nonlinear correction, and its nano characterization and measurement accuracy are superior to99.5%.
technical parameter
Working mode | Contact mode, tap mode | Sample weight | ≤0.5Kg |
Optional mode | Friction/lateral force, amplitude/phase, magnetic/electrostatic force | Z lifting platform | Stepper motor drive control, minimum step size 10nm |
Force spectrum curve | F-Z force curve, RMS-Z curve | Z lifting stroke | 15mm (optional 20mm, 25mm) |
XY scanning method | Sample driven scanning, closed-loop piezoelectric translation scanning stage | Optical positioning | 5X optical objective lens (optional 10X/20X objective lens) |
Z-scan method | Probe driven scanning | camera | 5-megapixel digital CCD |
XY scanning range | Closed loop 100 × 100um | Scanning rate | 0.6Hz~30Hz |
Z-scan range | 5um | Scanning angle | 0~360° |
Scanning resolution | Closed loop XY direction 0.5nm, Z direction 0.05nm | Operating environment | Windows XP/7/8/10 operating system |
XY sample stage | Stepper motor drive control, with a movement accuracy of 1um | communication interface | USB2.0/3.0 |
XY movement stroke | 100 × 100mm (optional 200 × 200mm, 300 × 300mm) | Instrument structure | Longmen style scanning head, marble base |
Sample stage | Diameter 100mm (optional 200mm, 300mm) | Shock absorption method | Spring suspension type (optional active shock absorber platform) |
Application Cases
Gallium arsenide wafer/Scanning range0.9µm×0.9µm/Sa=2.15nm, Sq=2.69nm